Novel configurations of atomic beam and laser beam for micro and nanolithography

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dc.contributor.author Alti, Kamlesh Mukundrao
dc.date.accessioned 2020-08-06T10:57:42Z
dc.date.available 2020-08-06T10:57:42Z
dc.date.issued 2005
dc.identifier.other ROLL NO.01612101
dc.identifier.uri http://gyan.iitg.ernet.in/handle/123456789/1535
dc.description Supervisor: Alika Khare en_US
dc.description.abstract Present work mainly focus on two lithographic techniques viz. selective laser ablation lithography and atom lithography using dipole force. The work on atom lithography using dipole is on simulation of atomic trajectories under dipoleforce using semi-classical technique for various configuration of atomic beams and light fields to focus down the atomic beam at sub-micron level. Through these studies new configuration of light fields and atomic beams were proposed for their applications in the field of microlithography and nanolithography. We proposed the use of square arrays of multiple atomic lens produced by interference of four nearly collinear optical beams in atom lithography using dipole force. This configuration is useful in writing large number of micro-periodic structure in square arrays in a single step via atom lithography. A novel configuration of microscopic square arrays... en_US
dc.language.iso en en_US
dc.relation.ispartofseries TH-0258;
dc.subject PHYSICS en_US
dc.title Novel configurations of atomic beam and laser beam for micro and nanolithography en_US
dc.type Thesis en_US


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